FACILITYEquipment
Equipment Devices & Displays Research Lab.
Process Facilities and Equipment
Photochemical process
| Name | Mask aligner UV exposure |
|---|---|
| Model | KCMA-100 |
| Manufacture | KumChang |
| Spec1 | Sample Size 4" |
| Spec2 | Contact, Non-contact, Vacuum mode |
| Spec3 |
| Name | DUV Chamber (Xe) |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | 250 ~ 700 nm (100%) |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | DUV Chamber (Xe, Excimer) |
|---|---|
| Model | UV Ozone Cleaner UV-1 |
| Manufacture | Samco |
| Spec1 | 250 ~ 700 nm (100%) |
| Spec2 | Sample Size 4" |
| Spec3 |
Unable to apply for
| Name | DUV Chamber (Hg) |
|---|---|
| Model | UV Ozoon Cleaner UV253V8 |
| Manufacture | Filgen |
| Spec1 | 184.9nm (10%) |
| Spec2 | 253.7nm (90%) |
| Spec3 |
Unable to apply for
Vacuum process
| Name | Thermal Evaporator |
|---|---|
| Model | |
| Manufacture | GD-Tech |
| Spec1 | Metal: Ag/Al/Au/Cr/Ni |
| Spec2 | Sample Size 4" |
| Spec3 |
| Name | Thermal Evaporator |
|---|---|
| Model | |
| Manufacture | GD-Tech |
| Spec1 | Metal: Ag/Al/Au/Cr/Sn/Ti |
| Spec2 | Sample Size 4" |
| Spec3 |
| Name | RF-Sputter |
|---|---|
| Model | |
| Manufacture | Daeki Hi-Tech |
| Spec1 | Sample Size 4" |
| Spec2 | Target size: 4" |
| Spec3 |
| Name | RF-Magnetron Sputter |
|---|---|
| Model | |
| Manufacture | Daeki Hi-Tech |
| Spec1 | Sample Size 4" |
| Spec2 | Materials(Oxide): IGZO, ITO, Mo, etc. |
| Spec3 | Co-sputtering with 3 targets |
Unable to apply for
| Name | RF-Magnetron Sputter |
|---|---|
| Model | |
| Manufacture | Daeki Hi-Tech |
| Spec1 | Sample Size 4" |
| Spec2 | Materials(Oxide): IGZO, ITO, IZTO, IGTO, GaOx, HfOx, etc. |
| Spec3 | Co-sputtering with 3 targets |
Unable to apply for
| Name | Reactive Ion Etcher |
|---|---|
| Model | |
| Manufacture | Daeki Hi-Tech |
| Spec1 | Sample Size 4" |
| Spec2 | Ar, O2, CF4, etc. |
| Spec3 | Power: ≤200W |
Unable to apply for
| Name | Atomic Layer Deposition |
|---|---|
| Model | |
| Manufacture | ISAC |
| Spec1 | Sample Size 5" |
| Spec2 | AlOx, ZnOx, etc. |
| Spec3 |
Unable to apply for
Solution process
| Name | Wet Station |
|---|---|
| Model | |
| Manufacture | ID-Tech |
| Spec1 | Wet Etching process |
| Spec2 | Sample Cleaning |
| Spec3 |
Unable to apply for
| Name | Sonicator |
|---|---|
| Model | 2510E-DTH |
| Manufacture | Branson |
| Spec1 | 2.8L |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Spin-Coater |
|---|---|
| Model | SP-6 |
| Manufacture | PRO Win |
| Spec1 | 100 ~ 6,000 rpm |
| Spec2 | 20 Recipe, 10 step |
| Spec3 | Sample Size (Max) 6 inch wafer |
Unable to apply for
| Name | Spin-Coater |
|---|---|
| Model | VSF -100MD |
| Manufacture | Rhabdos |
| Spec1 | 1~5,000 rpm (load & unload) |
| Spec2 | Process Memory 800 (recipes) |
| Spec3 | Sample Size (Max) 75 * 75 mm |
Unable to apply for
| Name | Glove Box |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Metal & Organic, Nano-particles, QDs |
| Spec2 | Sample Size 4" |
| Spec3 | OLEDs, OPVs |
Unable to apply for
| Name | Spin-Coater (Glove box) |
|---|---|
| Model | ACE-200 |
| Manufacture | Dong Ah |
| Spec1 | 50 ~ 10,000 rpm |
| Spec2 | 100 program |
| Spec3 | Sample Size (Max) 4" |
Unable to apply for
| Name | Hot plate |
|---|---|
| Model | |
| Manufacture | Daihan Scilab |
| Spec1 | ≤550℃ |
| Spec2 | ≤1500 rpm |
| Spec3 |
Unable to apply for
| Name | Hot plate |
|---|---|
| Model | EC-1200N |
| Manufacture | AS ONE |
| Spec1 | ≤300℃ |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Ultra-sonicator |
|---|---|
| Model | Probe-type Ultrasonic Processor |
| Manufacture | Sonics&Materials |
| Spec1 | 20kHz |
| Spec2 | Amplitude: 0~100% |
| Spec3 | Timer: ≤10 hour |
Unable to apply for
| Name | Spray coater |
|---|---|
| Model | HT-MSC |
| Manufacture | HanTeck |
| Spec1 | ≤180℃ |
| Spec2 | Air Mist Nozzle: Φ0.5, Φ0.9 |
| Spec3 | Bar coating, Spray coating, Blanding coating |
Unable to apply for
| Name | Oven |
|---|---|
| Model | SH-DO |
| Manufacture | SH Scientific |
| Spec1 | ≤250℃ |
| Spec2 | 100L |
| Spec3 |
Unable to apply for
| Name | Centrifuge |
|---|---|
| Model | Smart R17 plus |
| Manufacture | Hanil |
| Spec1 | ≤17,000 rpm |
| Spec2 | -10℃ to 40℃ |
| Spec3 | 24×1.5/2.0 ㎖ |
Unable to apply for
Measurement & Analysis
| Name | Probe station |
|---|---|
| Model | 4156C |
| Manufacture | MS Tech |
| Spec1 | |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Probe station |
|---|---|
| Model | 4156B |
| Manufacture | MS Tech |
| Spec1 | |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Polarized Optical Microscope |
|---|---|
| Model | LV100NP |
| Manufacture | Nikon |
| Spec1 | 5×, 10×, 20×, 50×, 100× |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Gas Flow measurement station |
|---|---|
| Model | 4155C |
| Manufacture | |
| Spec1 | NO2, NH3, Air balance |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | AFM |
|---|---|
| Model | NX10 |
| Manufacture | Park systems |
| Spec1 | Sample Size 4" |
| Spec2 | Non-contact, Vacuum mode |
| Spec3 |
Unable to apply for
| Name | Parameter analyzer |
|---|---|
| Model | 4200A-SCS |
| Manufacture | Keithley |
| Spec1 | I-V measurement |
| Spec2 | In-Situ measurement |
| Spec3 |
Unable to apply for
Maintenance
| Name | DI water system |
|---|---|
| Model | WET-DI |
| Manufacture | ShinhanST |
| Spec1 | ≤200l/hr |
| Spec2 | ≤10㎲/cm |
| Spec3 |
Unable to apply for
| Name | Temperature & humidity Control System |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Temperature : 25° |
| Spec2 | Humidity : 30% |
| Spec3 |
Unable to apply for
| Name | N2 Generator |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Capacity : 15 N-m2/Hour |
| Spec2 | Purity : 99.99% |
| Spec3 | N2 pressure : 5 bar |
Unable to apply for
